Technological applications will be presented alongside fundamental measurements and theories. The main scientific areas include:

• Fundamental physical phenomena;
• Point and extended defects in wide band-gap systems;
• Defects at surfaces and interfaces;
• Thin films and low-dimensional systems;
• Nanocrystals, colloids and aggregates;
• Defects and material preparation technology;
• Defects modeling and computational methods;
• Radiation effects, radiation induced defects, colour centers;
• Luminescence spectroscopy of excitons, impurities, and defects, including using of synchrotron radiation;
• Electronic excitations, excited state dynamics, radiative and non-radiative relaxations;
• Scintillation, energy transfer and storage, carrier trapping phenomena;
• Laser active centers;
• Defect related non-linear optical phenomena;
• Phonons and defects, electron-phonon interactions;
• Defect diffusion, ionic relaxations, ionic transport;
• Technological applications including:
  – Radiological and radiometric imaging and detection (scintillators and dosimeters);
  – Optical devices and photonics, photorefractive electro-optics, optical fibres, lasers;
  – Materials for opto-electronics, photonics and micro-electronics;
  – Solid electrolytes, fuel cells, electrochemical sensors, fast ionic conductors;

Akira Yoshikawa (Japan)
Alan Chadwick (UK)
Aleksandr Lushchik (Estonia)
Anatoli Popov (Latvia)
Anna Vedda (Italy)
Chris Stanek (USA)
Christophe Dujardin (France)
Darrell Comins (South Africa)
Frank Bridges (USA)
Graeme Watson (Ireland)
Henk Vrielinck (Belgium)
Joachim Maier (Germany)
Juan García Lastra (Spain)
László Kovács (Hungary)
Marie-Geneviève Blanchin (France)
Mario E. G. Valerio (Brazil)
Martin Nikl (Czech Republic)
Phuti Ngoepe (South Africa)
Rob Jackson (UK)
Rosa Maria Montereali (Italy)
Sergiu Nistor (Romania)
Siegmund Greulich-Weber (Germany)
Volkmar Dierolf (USA)
Yuriy Zorenko (Poland)